Kesters, ElsElsKestersClaes, MartineMartineClaesLux, MarcelMarcelLuxLe, Quoc ToanQuoc ToanLeVereecke, GuyGuyVereeckeFranquet, AlexisAlexisFranquetConard, ThierryThierryConardMertens, PaulPaulMertensAdriaensens, PeterPeterAdriaensensCarleer, RobertRobertCarleerBiebuyck, J.J.J.J.BiebuyckVan Veltem, P.P.Van VeltemBebelman, SabineSabineBebelman2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12392Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemesOral presentation