Applications of dynamic surface annealing for high-performance Si and Ge based MOS devices

Rosseel, ErikErikRosseelEveraert, Jean-LucJean-LucEveraertHikavyy, AndriyAndriyHikavyyWitters, LiesbethLiesbethWittersMitard, JeromeJeromeMitardVandervorst, WilfriedWilfriedVandervorst2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19706Applications of dynamic surface annealing for high-performance Si and Ge based MOS devicesOral presentation