O'Sullivan, BarryBarryO'SullivanPourtois, GeoffreyGeoffreyPourtoisKaushik, VidyaVidyaKaushikSchram, TomTomSchramKittl, JorgeJorgeKittlPantisano, LuigiLuigiPantisanoDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-162021-10-162007-07https://imec-publications.be/handle/20.500.12860/12661Charge characterisation in metal-gate/high-k layers: Effect of post-deposition annealing and gate electrodeJournal article