Charge trapping in SiO2/HfO2 dual layer gate stacks

Cartier, E.E.CartierKerber, A.A.KerberPantisano, LuigiLuigiPantisano2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8660Charge trapping in SiO2/HfO2 dual layer gate stacksProceedings paper