Polarity dependence of defect generation in ultrathin SiO2/ZrO2 gate dielectric stacks

Houssa, MichelMichelHoussaAfanas'ev, V. V.V. V.Afanas'evStesmans, AndreAndreStesmansHeyns, MarcMarcHeyns2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5349Polarity dependence of defect generation in ultrathin SiO2/ZrO2 gate dielectric stacksJournal article