Yen, AnthonyAnthonyYenTritchkov, AlexanderAlexanderTritchkovStirniman, J. P.J. P.StirnimanVandenberghe, GeertGeertVandenbergheJonckheere, RikRikJonckheereRonse, KurtKurtRonseVan den hove, LucLucVan den hove2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1678Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modelingJournal article