A new HF vapor native oxide removal process for cluster applications

Sprey, HesselHesselSpreyStorm, ArjenArjenStormMaes, JanJanMaesGranneman, E. H. A.E. H. A.GrannemanHendriks, MartonMartonHendriksRöhr, ErikaErikaRöhrCaymax, MattyMattyCaymaxDecoutere, StefaanStefaanDecoutereHeyns, MarcMarcHeyns2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2968A new HF vapor native oxide removal process for cluster applicationsProceedings paper