Simulating plasma + surface processes for the etching of silicon wtih an Ar/Cl2/O2 inductively coupled plasma

Tinck, StefanStefanTinckBogaerts, AnnemieAnnemieBogaertsBoullart, WernerWernerBoullart2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19893Simulating plasma + surface processes for the etching of silicon wtih an Ar/Cl2/O2 inductively coupled plasmaMeeting abstract