Karouta, F.F.KaroutaJacobs, B.B.JacobsKramer, M. C. J. C. M.M. C. J. C. M.KramerJacobs, KoenKoenJacobsMoerman, IngridIngridMoerman2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3551Chemical role of SF6 in a SiCl4-based reactive ion etching of GaNOral presentation