Two-step p-MTJ patterning schemes for low density, high yield STT-MRAM devices for embedded applications

Rao, SiddharthSiddharthRaoSouriau, LaurentLaurentSouriauCrotti, DavideDavideCrottiSwerts, JohanJohanSwertsKim, WoojinWoojinKimKundu, ShreyaShreyaKunduDonadio, Gabriele LucaGabriele LucaDonadioCouet, SebastienSebastienCouetFurnemont, ArnaudArnaudFurnemontKar, Gouri SankarGouri SankarKar2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27193Two-step p-MTJ patterning schemes for low density, high yield STT-MRAM devices for embedded applicationsOral presentation