Substrate noise isolation experiments in a 0.18μm 1P6M triple-well CMOS process on a lightly doped substrate

Vinella, Rosa MariaRosa MariaVinellaVan der Plas, GeertGeertVan der PlasSoens, CharlotteCharlotteSoensRizzi, MariaMariaRizziCastagnolo, BeniaminoBeniaminoCastagnolo2021-10-162021-10-162007-05https://imec-publications.be/handle/20.500.12860/13190Substrate noise isolation experiments in a 0.18μm 1P6M triple-well CMOS process on a lightly doped substrateProceedings paper