O'Sullivan, BarryBarryO'SullivanPutcha, VamsiVamsiPutchaIzmailov, RomanRomanIzmailovAfanas'ev, Valeri V.Valeri V.Afanas'evSimoen, EddyEddySimoenJung, TaehwanTaehwanJungHigashi, YusukeYusukeHigashiDegraeve, RobinRobinDegraeveTruijen, BrechtBrechtTruijenKaczer, BenBenKaczerRonchi, NicoloNicoloRonchiMcMitchell, SeanSeanMcMitchellBanerjee, KaustuvKaustuvBanerjeeClima, SergiuSergiuClimaBreuil, LaurentLaurentBreuilVan den Bosch, GeertGeertVan den BoschLinten, DimitriDimitriLintenVan Houdt, JanJanVan Houdt2021-10-292021-10-2920200003-6951https://imec-publications.be/handle/20.500.12860/35686Defect profiling in FEFET Si:HfO2 layersJournal articlehttps://doi.org/10.1063/5.0029072