Low-cost solution processed high-k gate dielectric materials for large area circuit applications

Lin, Wan-YuWan-YuLinMuller, RobertRobertMullerSteudel, SoerenSoerenSteudelMyny, KrisKrisMynyGenoe, JanJanGenoeHeremans, PaulPaulHeremans2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17503Low-cost solution processed high-k gate dielectric materials for large area circuit applicationsMeeting abstract