Vandeweyer, TomTomVandeweyerBekaert, JoostJoostBekaertErcken, MoniqueMoniqueErckenGronheid, RoelRoelGronheidMiller, AndyAndyMillerTruffert, VincentVincentTruffertVerhaegen, StafStafVerhaegenVersluijs, JankoJankoVersluijsWiaux, VincentVincentWiauxWong, PatrickPatrickWongVandenberghe, GeertGeertVandenbergheMaenhoudt, MireilleMireilleMaenhoudt2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18230Immersion lithography and double patterning in advanced microelectronicsProceedings paper