Next generation of decision making software for nanopatterns metrology: application to semiconductor industry

Dervillé, A.A.DervilléLabrosse, A.A.LabrosseZimmermann, Y.Y.ZimmermannFoucher, JohannJohannFoucherGronheid, RoelRoelGronheidBoeckx, CarolienCarolienBoeckxSingh, ArjunArjunSinghLeray, PhilippePhilippeLerayHalder, SandipSandipHalder2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26539Next generation of decision making software for nanopatterns metrology: application to semiconductor industryProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2507055&resultClick=1