Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures

Heyne, MarkusMarkusHeyneGoodyear, AndyAndyGoodyearde Marneffe, Jean-FrancoisJean-Francoisde MarneffeCooke, MikeMikeCookeNeyts, ErikErikNeytsRadu, IulianaIulianaRaduDe Gendt, StefanStefanDe Gendt2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28506Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructuresProceedings paperhttp://www.iplasmanano.org/files/iPlasmaNano_VIII_Programme-LS.pdf?v=4