Stress characteritzation of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser anneal

Bargallo Gonzalez, MireiaMireiaBargallo GonzalezFernandez Lanas, TatianaTatianaFernandez LanasRosseel, ErikErikRosseelHikavyy, AndriyAndriyHikavyyDekkers, HaroldHaroldDekkersEneman, GeertGeertEnemanVerheyen, PeterPeterVerheyenLoo, RogerRogerLooSimoen, EddyEddySimoenClaeys, CorCorClaeys2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/14943Stress characteritzation of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser annealMeeting abstract