Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resist

Mannaert, GeertGeertMannaertBaklanov, MikhaïlMikhaïlBaklanovGoossens, DannyDannyGoossensVrancken, ChristaChristaVranckenBoullart, WernerWernerBoullart2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14114Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resistProceedings paper