The effect of delay between dry etch and wet clean processing steps on cleaning of post-etch residues

Hellin, DavidDavidHellinVos, IngridIngridVosVereecke, GuyGuyVereeckePavel, E.E.PavelBoullart, WernerWernerBoullartVertommen, JohanJohanVertommen2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12267The effect of delay between dry etch and wet clean processing steps on cleaning of post-etch residuesProceedings paper