Cho, Hag-JuHag-JuChoYu, Hong YuHong YuYuChang, Vincent S.Vincent S.ChangAkheyar, AmalAmalAkheyarJakschik, StefanStefanJakschikConard, ThierryThierryConardHantschel, ThomasThomasHantschelDelabie, AnneliesAnneliesDelabieAdelmann, ChristophChristophAdelmannVan Elshocht, SvenSvenVan ElshochtRagnarsson, Lars-AkeLars-AkeRagnarssonSchram, TomTomSchramAbsil, PhilippePhilippeAbsilBiesemans, SergeSergeBiesemans2021-10-172021-10-172008-070741-3106https://imec-publications.be/handle/20.500.12860/13519The impact of stacked cap layers on effective work function with HfSiON and SiON gate dielectricsJournal articlehttp://ieeexplore.ieee.org/iel5/55/4558060/04558118.pdf?tp=&isnumber=4558060&arnumber=4558118&punumber=55