Double patterning with dual hard mask for 28nm node devices and below

Hody, HubertHubertHodyParaschiv, VasileVasileParaschivVecchio, EmmaEmmaVecchioLocorotondo, SabrinaSabrinaLocorotondoWinroth, GustafGustafWinrothAthimulam, RajaRajaAthimulamBoullart, WernerWernerBoullart2021-10-212021-10-2120131537-1646https://imec-publications.be/handle/20.500.12860/22496Double patterning with dual hard mask for 28nm node devices and belowJournal articleJ. Micro/Nanolith. MEMS MOEMS