Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development

Beckx, StephanStephanBeckxDemand, MarcMarcDemandLocorotondo, SabrinaSabrinaLocorotondoHenson, K.K.HensonClaes, MartineMartineClaesParaschiv, VasileVasileParaschivShamiryan, DenisDenisShamiryanJaenen, PatrickPatrickJaenenBoullart, WernerWernerBoullartDe Gendt, StefanStefanDe GendtBiesemans, SergeSergeBiesemansVanhaelemeersch, SergeSergeVanhaelemeerschVertommen, JohanJohanVertommenCoenegrachts, BartBartCoenegrachts2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8552Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning developmentOral presentation