Machine Learning on Multiplexed Optical Metrology Pattern Shift Response Targets to Predict Electrical Properties

Ashby, TomTomAshbyTruffert, VincentVincentTruffertCerbu, DorinDorinCerbuAusschnitt, KitKitAusschnittCharley, Anne-LaureAnne-LaureCharleyVerachtert, WilfriedWilfriedVerachtertWuyts, RoelRoelWuyts2024-09-302024-03-262024-09-3020240894-6507WOS:001167553100004https://imec-publications.be/handle/20.500.12860/43735Machine Learning on Multiplexed Optical Metrology Pattern Shift Response Targets to Predict Electrical PropertiesJournal article10.1109/TSM.2023.3339330WOS:001167553100004