Electrical characterization of ALD Al2O3 – HfO2 and PECVD Al2O3 passivation layers for p-type CZ-Silicon PERC solar cells

Morato, AlessandroAlessandroMoratoVermang, BartBartVermangGoverde, HansHansGoverdeCornagliotti, EmanueleEmanueleCornagliottiMeneghesso, GaudenzioGaudenzioMeneghessoJohn, JoachimJoachimJohnPoortmans, JefJefPoortmans2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21167Electrical characterization of ALD Al2O3 – HfO2 and PECVD Al2O3 passivation layers for p-type CZ-Silicon PERC solar cellsProceedings paper