Philipsen, VickyVickyPhilipsenLuong, VuVuLuongOpsomer, KarlKarlOpsomerSouriau, LaurentLaurentSouriauRip, JensJensRipDetavernier, ChristopheChristopheDetavernierErdmann, AndreasAndreasErdmannEvanschitzky, PeterPeterEvanschitzkyLaubis, ChristianChristianLaubisHoenicke, PhilippPhilippHoenickeSoltwisch, VictorVictorSoltwischHendrickx, EricEricHendrickx2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/33794Mask absorber development to enable next-generation EUVLProceedings paperhttps://doi.org/10.1117/12.2537967