Design and realization of a photolithography alignment and UV exposure equipment for pedagogical and laboratory experiment purposes

Mansano, RonaldoRonaldoMansanoOrdonez, NilsonNilsonOrdonezMorimoto, NiltonNiltonMorimotoVerdonck, PatrickPatrickVerdonckCarbonne, BertrandBertrandCarbonneDanto, YvesYvesDantoBonnaud, OlivierOlivierBonnaud2021-10-172021-10-1720081638-1963https://imec-publications.be/handle/20.500.12860/14116Design and realization of a photolithography alignment and UV exposure equipment for pedagogical and laboratory experiment purposesJournal articlehttp://www.j3ea.org/