Ultra-long-term reliable ensapsulation using an atomic layer deposited HfO2/Al2O3/HfO2 triple-interlayer for biomedical implant

Li, ChangzhengChangzhengLiCauwe, MaartenMaartenCauweYang, YangYangYangSchaubroeck, DavidDavidSchaubroeckMader, LotharLotharMaderOp de Beeck, MaaikeMaaikeOp de Beeck2021-10-272021-10-2720192079-6412https://imec-publications.be/handle/20.500.12860/33416Ultra-long-term reliable ensapsulation using an atomic layer deposited HfO2/Al2O3/HfO2 triple-interlayer for biomedical implantJournal articlehttps://doi.org/10.3390/coatings9090579