Nyns, LauraLauraNynsDelabie, AnneliesAnneliesDelabieSwerts, JohanJohanSwertsVan Elshocht, SvenSvenVan ElshochtDe Gendt, StefanStefanDe Gendt2021-10-182021-10-1820100013-4651https://imec-publications.be/handle/20.500.12860/17719ALD and parasitic growth characteristics of the tetrakisethylmethylamino hafnium TEMAH/H2O processJournal article