Jonckheere, RikRikJonckheereMoonens, JosJosMoonensPotoms, GoedeleGoedelePotomsBovie, IngeIngeBovieVan den hove, LucLucVan den hove2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/12874X reticles with 3% linewidth control for the development of 0.18 µm lithographyProceedings paper