Philipsen, VickyVickyPhilipsenLuong, VuVuLuongSouriau, LaurentLaurentSouriauErdmann, AndreasAndreasErdmannXu, DongboDongboXuEvanschitzky, PeterPeterEvanschitzkyVan de Kruijs, RobbertRobbertVan de KruijsEdrisi, ArashArashEdrisiScholze, FrankFrankScholzeLaubis, ChristianChristianLaubisIrmscher, MathiasMathiasIrmscherNaasz, SandraSandraNaaszReuter, ChristianChristianReuterHendrickx, EricEricHendrickx2021-10-242021-10-2420171932-5150https://imec-publications.be/handle/20.500.12860/29171Reducing EUV mask 3D effects by alternative metal absorbersJournal article10.1117/1.JMM.16.4.041002