Wong, PatrickPatrickWongGronheid, RoelRoelGronheidWiaux, VincentVincentWiauxVaglio Pret, AlessandroAlessandroVaglio PretVerhaegen, StafStafVerhaegenVandenbroeck, NadiaNadiaVandenbroeck2021-10-192021-10-1920100914-9244https://imec-publications.be/handle/20.500.12860/18368Three litho-process-litho approaches for 2D double patterning at the 32nm half pitch nodeJournal article