De Dobbelaere, C.C.De DobbelaereCalzada, M.L.M.L.CalzadaJimenez, R.R.JimenezRicote, J.J.RicoteBretos, I.I.BretosMullens, J.J.MullensHardy, AnAnHardyVan Bael, MarliesMarliesVan Bael2021-10-192021-10-1920110002-7863https://imec-publications.be/handle/20.500.12860/18781Aqueous solutions for low-temperature photoannealing of functional oxide films: reaching the 400 degrees C Si-technology integration barrierJournal article