Ronse, KurtKurtRonseMaenhoudt, MireilleMireilleMaenhoudtMarschner, ThomasThomasMarschnerVan den hove, LucLucVan den hoveStreefkerk, B.B.StreefkerkFinders, JoJoFindersvan Schoot, J.J.van SchootLuehrmann, P.P.LuehrmannMinvielle, A.A.Minvielle2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2913CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printingProceedings paper