Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE

Anunciado, RoyRoyAnunciadoLee, JisunJisunLeeBarzegar, EllahehEllahehBarzegarvan der Sanden, StefanStefanvan der SandenSchelcher, GuillaumeGuillaumeSchelcherSchoofs, StijnStijnSchoofs2024-04-092024-04-0920220277-786XWOS:000944102600018https://imec-publications.be/handle/20.500.12860/43803Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPEProceedings paper10.1117/12.2637772978-1-5106-5640-6WOS:000944102600018