Amorphous-IGZO thin-film-transistors with mf-PVD SiO2 as an etch-stop-layer

Nag, ManojManojNagSteudel, SoerenSoerenSteudelBhoolokam, AjayAjayBhoolokamVaisman Chasin, AdrianAdrianVaisman ChasinMyny, KrisKrisMynyMass, JorisJorisMassFritz, ThomasThomasFritzTrube, JuttaJuttaTrubeGelinck, GerwinGerwinGelinckGroeseneken, GuidoGuidoGroesenekenHeremans, PaulPaulHeremans2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24303Amorphous-IGZO thin-film-transistors with mf-PVD SiO2 as an etch-stop-layerOral presentation