Real-time monitoring of wet chemial oxidation and etching processes on semiconductor surfaces for process optimization and waste minimization

Schmidt, HaraldHaraldSchmidtTeerlinck, IvoIvoTeerlinckBiesemans, SergeSergeBiesemansHeyns, MarcMarcHeyns2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1457Real-time monitoring of wet chemial oxidation and etching processes on semiconductor surfaces for process optimization and waste minimizationMeeting abstract