Apostolopoulos, G.G.ApostolopoulosVellianitis, G.G.Vellianitisdimoulas, A.A.dimoulasHooker, JacobJacobHookerConard, ThierryThierryConard2021-10-152021-10-152004-01https://imec-publications.be/handle/20.500.12860/8480Complex admittance analysis for La2Hf2O7/SiO2 high-kappa dielectric stacksJournal article