Characterization and optimization of sub-32nm FinFET devices for ESD applications

Thijs, StevenStevenThijsTremouilles, DavidDavidTremouillesRuss, ChristianChristianRussGriffoni, AlessioAlessioGriffoniCollaert, NadineNadineCollaertRooyackers, RitaRitaRooyackersLinten, DimitriDimitriLintenScholz, MirkoMirkoScholzDuvvury, CharvakaCharvakaDuvvuryGossner, HaraldHaraldGossnerJurczak, GosiaGosiaJurczakGroeseneken, GuidoGuidoGroeseneken2021-10-172021-10-1720080018-9383https://imec-publications.be/handle/20.500.12860/14549Characterization and optimization of sub-32nm FinFET devices for ESD applicationsJournal article