In-line critical dimension and sidewall roughness metrology study for compound nanostructure process control by in-line 3D atomic force microscopy

Kim, Tae-GonTae-GonKimRyu, HenryHenryRyuJo, Ah-jinAh-jinJoCho, Sang-JoonSang-JoonChoPark, Sang-ilSang-ilParkVandeweyer, TomTomVandeweyer2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26832In-line critical dimension and sidewall roughness metrology study for compound nanostructure process control by in-line 3D atomic force microscopyMeeting abstracthttp://ma.ecsdl.org/content/MA2016-02/30/1950.abstract