Band alignment and effective work function of atomiclayer deposited VO2 and V2O5 films on SiO2 and Al2O3

Cerbu, FlorinFlorinCerbuChou, H.S.H.S.ChouRadu, IulianaIulianaRaduMartens, KoenKoenMartensPeter, AntonyAntonyPeterAfanasev, ValeriValeriAfanasevStesmans, AndreAndreStesmans2021-10-222021-10-2220151610-1634https://imec-publications.be/handle/20.500.12860/25046Band alignment and effective work function of atomiclayer deposited VO2 and V2O5 films on SiO2 and Al2O3Journal articlehttp://onlinelibrary.wiley.com/doi/10.1002/pssc.201400037/abstract