One-mask CMOS compatible process for the fabrication of three-dimensional self-assembled thin-film SOI microelectromechanical systems

Iker, FrancoisFrancoisIkerAndré, N.N.AndréPardoen, T.T.PardoenRaskin, J.P.J.P.Raskin2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10633One-mask CMOS compatible process for the fabrication of three-dimensional self-assembled thin-film SOI microelectromechanical systemsJournal article