Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)

Rezvanov, A.A.RezvanovGutshin, O.O.GutshinGornev, E.E.GornevKrasnikov, G.G.KrasnikovMogil'nikov, K.K.Mogil'nikovZhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeDussarat, C.C.DussaratBaklanov, MikhaïlMikhaïlBaklanov2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25815Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)Journal article