Yuito, TakashiTakashiYuitoWiaux, VincentVincentWiauxVan Look, LieveLieveVan LookVandenberghe, GeertGeertVandenbergheIrie, ShigeoShigeoIrieMatsuo, TakahiroTakahiroMatsuoMisaka, AkioAkioMisakaWatanabe, HisashiHisashiWatanabeSasago, MasruMasruSasago2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11600Mask enhancer technology for 45-nm node contact hole fabricationProceedings paper