Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

Lorusso, GianGianLorussoInoue, OsamuOsamuInoueOhashi, TakeyoshiTakeyoshiOhashiAltamirano Sanchez, EfrainEfrainAltamirano SanchezConstantoudis, VassiliosVassiliosConstantoudisKoshihara, ShunsukeShunsukeKoshihara2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26930Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning processProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505740&resultClick=1