Vitchev, R.G.R.G.VitchevDefranoux, ChrChrDefranouxWolstenholme, JJWolstenholmeConard, ThierryThierryConardBender, HugoHugoBenderPireaux, J.J.J.J.Pireaux2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11522Effective attenuation length of Al Ka-excited Si2p photoelectrons in SiO2, Al2O3 and HfO2 thin filmsJournal article