Overbake: sub-40-nm gate patterning with ArF lithography and binary masks

Van Steenwinckel, DavidDavidVan SteenwinckelKwinten, HansHansKwintenLocorotondo, SabrinaSabrinaLocorotondoBeckx, StephanStephanBeckx2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9802Overbake: sub-40-nm gate patterning with ArF lithography and binary masksProceedings paper