Characterization of plasma damage in low-k films by TVS measurements

Ciofi, IvanIvanCiofiBaklanov, MikhaïlMikhaïlBaklanovCalbo, GiovanniGiovanniCalboTokei, ZsoltZsoltTokeiBeyer, GeraldGeraldBeyer2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15098Characterization of plasma damage in low-k films by TVS measurementsProceedings paper