Kauerauf, ThomasThomasKaueraufDemuynck, StevenStevenDemuynckTokei, ZsoltZsoltTokeiCroes, KristofKristofCroesBeyer, GeraldGeraldBeyerGroeseneken, GuidoGuidoGroeseneken2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13939Reliability analysis of Cu contacts with various diffusion barriersMeeting abstract