Model-based design improvements for the 100nm lithography generation

Lucas, KevinKevinLucasPostnikov, SergeiSergeiPostnikovPatterson, KyleKylePattersonYuan, Min-ChiMin-ChiYuanThomas, CarlaCarlaThomasThompson, MattMattThompsonCarter, RustyRustyCarterLitt, LloydLloydLittMontgomery, PatrickPatrickMontgomeryWimmer, KarlKarlWimmer2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6557Model-based design improvements for the 100nm lithography generationProceedings paper