X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry study of the role of Ti and TiN caps on the cobalt/SiO2 interface

Conard, ThierryThierryConardKondoh, EiichiEiichiKondohDe Witte, HildeHildeDe WitteMaex, KarenKarenMaexVandervorst, WilfriedWilfriedVandervorst2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3313X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry study of the role of Ti and TiN caps on the cobalt/SiO2 interfaceJournal article